Investigation of diffusion and crystallization processes in thin ITO films by temperature and time resolved grazing incidence X-ray diffractometry

Surface Science

Volumn 540, Issue 2-3, 2003, Pages 337-342

  Quaas, M ^a   Steffen, H ^a   Hippler, R ^a   Wulff, H ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

Author keywords

Amorphous thin films; Crystallization; Diffusion and migration; Models of surface kinetics; Sputter deposition; X ray scattering, diffraction, and reflection

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CRYSTALLIZATION; DIFFUSION; INDIUM COMPOUNDS; KINETIC THEORY; MAGNETRON SPUTTERING; X RAY DIFFRACTION ANALYSIS;

BIAS VOLTAGE;

THIN FILMS;

EID: 0042661105     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00850-1     Document Type: Article

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