Cross-sectional TEM investigation of nickel-catalysed carbon nanotube films grown by plasma-enhanced CVD

Journal of Microscopy

Volumn 219, Issue 2, 2005, Pages 69-75

  Yao, Y ^a   Falk, Lena K L ^a   Morjan, R E ^b   Nerushev, O A ^b   Campbell, E E B ^b  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^b UNIVERSITY OF GOTHENBURG   (Sweden)

Author keywords

CNT film; Cross sectional TEM; Interface; Metal dusting; Ni catalyst; Nucleation

Indexed keywords

CARBON FILMS; CATALYSIS; CATALYSTS; GRAPHENE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MULTIWALLED CARBON NANOTUBES (MWCN); NICKEL; NUCLEATION; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; YARN;

CARBON NANOTUBES FILMS; CNT FILMS; CROSS-SECTIONAL TEM; METAL DUSTING; NI CATALYSTS; NICKEL PARTICLES; PLASMA-ENHANCED CVD; SILICON SUBSTRATES; SYNTHESISED; TUBE GROWTH;

INTERFACES (MATERIALS);

ACETYLENE; AMMONIA; CARBON NANOTUBE; NANOPARTICLE; NANOTUBE; NICKEL; SILICON;

ARTICLE; CATALYSIS; CATALYST; DUST; PRIORITY JOURNAL; SYNTHESIS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 24744446574     PISSN: 00222720     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1365-2818.2005.01494.x     Document Type: Article

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