Synthesis of carbon nanotube films by thermal CVD in the presence of supported catalyst particles. Part I: The silicon substrate/nanotube film interface

Journal of Materials Science: Materials in Electronics

Volumn 15, Issue 8, 2004, Pages 533-543

  Yao, Y ^a   Falk, L K L ^a   Morjan, R E ^a   Nerushev, O A ^a   Campbell, E E B ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ACETYLENE; CATALYST SUPPORTS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; HEAT TREATMENT; HYDROGEN; INTERFACES (MATERIALS); SEMICONDUCTING SILICON; SUBSTRATES; SYNTHESIS (CHEMICAL); THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

BASE GROWTH MECHANISM; CARBON NANOTUBE FILMS; CATALYTIC IRON SILICIDES; MICRODIFFRACTION PATTERNS; THIN IRON FILMS;

CARBON NANOTUBES;

EID: 3142763784     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JMSE.0000032588.60083.56     Document Type: Article

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