Study of 157 nm resists with full field exposure tools

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 572-583

  Wei, Yayi ^a   Stepanenko, Nickolay ^b   Sebald, Michael ^b   Hohle, Christoph ^b   Houlihan, Francis ^c,d   Sakamuri, Raj ^c   Dimerli, Alla ^c   Romano, Andrew ^c   Dammel, Ralph R ^c  

^a INFINEON TECHNOLOGIES   (United States)

^b Infineon   (Germany)

^c AZ Electronic Materials USA Corp   (United States)

^d CLARIANT CORPORATION   (United States)

Author keywords

157 nm lithography; 157 nm photoresist; Amine barrier coat; Full field exposure tool

Indexed keywords

157NM LITHOGRAPHY; 157NM PHOTORESIST; AMINE BARRIER COAT; FULL FIELD EXPOSURE TOOLS;

ALCOHOLS; AMINES; FLUORINE COMPOUNDS; MASKS; PERFORMANCE; PHASE SHIFT; RESINS;

PHOTORESISTS;

EID: 24644487445     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601811     Document Type: Conference Paper

References (8)

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2. Shun-ichi Kodama, Isamu Kaneko, Yoko Takebe, Shinji, Okada, Yasuhide, Kawaguchi, Naomi Schida, Seiichi Ishikawa, Minoru Toriumi, Toshiro Itani, Advances in Resist Technology and Processing XIX, Proceedings of SPIE Vol 4690 p76 (2002).
3. Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph R. Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joe McDaniels, Chun Chang, Advances in Resist Technology and Processing XX, Proceedings of SPIE 5039, 22 (2003);
4. Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph R. Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joe McDaniels, Chun Chang, Journal of Photopolymer Science and Technology, Volume 16(4), 581 (2003).
5. Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph R. Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joe McDaniels, ChunChang Advances in Resist Technology and Processing XX, Proceedings of SPIE 5039, 641(2003).
6. Francis Houlihan*, Raj Sakamuria, Andrew Romano, David Rentkiewicz, Ralph R. Dammel, Will Conley, Daniel Miller, Michael Sebald, Nickolay Stepanenko, M. Markert, U. Mierau, Inge.Vermeir, Christoph Hohle, Toshiro Itani, Masato Shigematsu, Etsuro Kawaguchi, Advances in Resist Technology and Processing XXI, Proceedings of SPIE 5376, 134(2004)
7. Francis Houlihan*, Raj Sakamuri, Andrew Romano, David Rentkiewicz, Ralph R. Dammel, Will Conley, Daniel Miller, Michael Sebald, Nickolay Stepanenko, M. Markert, U. Mierau, Inge.Vermeir, Christoph Hohle, Toshiro Itani, Masato Shigematsu, Etsuro Kawaguchi Journal of Photopolymer Science and Technology, Volume 17(4), 621(2004).
8. "Surface Roughness Investigation of 157nm and 193nm Polymer Platforms using different Etch Conditions," Christoph Hohle, Matthias Markert, Nicole Heusinger, Nickolay Stepanenko, Michael Sebald, Francis Houlihan, Andrew Romano, Raj Sakamuri, David Rentkiewicz, and Ralph R. Dammel, To be published JM3 (2005).