Multiple CD-SEM matching for 0.18 μm lines/spaces at different exposure conditions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue I, 1999, Pages 280-290

  Engelen, Andre ^a   Minnaert Janssen, Ingrid ^a  

^a ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING TECHNIQUES; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSION-SCANNING ELECTRON MICROSCOPES (CD-SEM);

PHOTORESISTS;

EID: 0032651647     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350817     Document Type: Conference Paper

References (8)