Highly accurate and precise measurement technique for effective exposure dose

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 12 B, 2000, Pages 6796-6800

  Izuha, Kyoko ^a   Fujisawa, Tadahito ^a   Asano, Masafumi ^a   Inoue, Soichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Duty ratio; Dynamic range expansion; Effective dose meter; Effective exposure dose; Grating

Indexed keywords

MASKS; OPTICAL RESOLVING POWER;

EXPOSURE DOSES;

PHOTOLITHOGRAPHY;

EID: 0034430261     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.6796     Document Type: Article

References (3)

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2. A. Starikov: Proc. SPIE 1261 (1990) 315.
3. S. Inoue, T. Fujisawa and K. Izuha: Proc. SPIE 3999 (2000) 810.