Recent advances in fluorinated resists for application at 157 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 134-150

  Houlihan, Francis ^a   Sakamuri, Raj ^a   Romano, Andrew ^a   Rentkiewicz, David ^a   Dammel, Ralph R ^a   Conley, Will ^b   Miller, Daniel ^b   Sebald, Michael ^c   Stepanenko, Nickolay ^c   Markert, M ^c   Mierau, U ^c   Vermeir, I ^c   Hohle, Christoph ^c   Itani, Toshiro ^d   Shigematsu, Masato ^d   Kawaguchi, Etsuro ^d  

^a CLARIANT CORPORATION   (United States)

^b SEMATECH   (United States)

^c INFINEON TECHNOLOGIES AG   (Germany)

^d SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

157 nm; High transparency; Resist

Indexed keywords

PHASE SHIFT MASKS; PHOTOACID GENERATORS; TRANSPARENT PERFLUORINATED RESINS (TFR);

ELECTRIC RESISTANCE; FLUORINE CONTAINING POLYMERS; IMAGING SYSTEMS; MASKS; ORGANIC ACIDS; PHASE SHIFT;

PHOTORESISTS;

EID: 3843094831     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537541     Document Type: Conference Paper

References (9)

1. th International Symposium on 157 nm Lithography August 2003, Yokohama Japan
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5. Shun-ichi Kodama, Isamu Kaneko, Yoko Takebe, Shinji, Okada, Yasuhide, Kawaguchi, Naomi Schida, Seiichi Ishikawa, Minoru Toriumi, Toshiro Itani, Advances in Resist Technology and Processing XIX, Proceedings of SPIE Vol 4690 p76 (2002).
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7. Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph R. Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joe McDaniels, Chun Chang, Journal of Photopolymer Science and Technology, Volume 16(4), 581 (2003).
8. Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph R. Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joe McDaniels, ChunChang Advances in Resist Technology and Processing XX, Proceedings of SPIE 5039, 641(2003).
9. H. Ito, W. Hinsberg, L. Rhodes, Chang, SPIE Proceedings Vol 5039, 70, 2003