Bake condition effect on hybrid lithography process for negative tone Chemically Amplified Resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999 (II), Issue , 2000, Pages 706-716

  Pain, L ^a   Sala, F ^a   Higgins, C ^a   Dal'zotto, B ^a   Tedesco, S ^a  

^a CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; ELECTRON BEAMS; PROCESS ENGINEERING; THERMAL DIFFUSION IN SOLIDS; ULTRAVIOLET RADIATION;

CHEMICALLY AMPLIFIED RESISTS (CAR) SYSTEMS; POST EXPOSURE BAKE (PEB) PROCESS;

PHOTORESISTS;

EID: 0033708354     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388357     Document Type: Conference Paper

References (7)