Ex situ formation of oxide-interlayer-mediated-epitaxial CoSi2 film using Ti capping

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 1, 1999, Pages 162-165

  Lee, Sung Man ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 24644467357     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (16)

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