Linear radio frequency plasma sources for large scale industrial applications in photovoltaics

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 958-961

  Schlemm, Hermann ^a,b   Fritzsche, M ^a   Roth, D ^a  

^a Roth and Rau AG   (Germany)

^b NONE   (Germany)

Author keywords

Hydrogen passivation of silicon; Linear plasma sources; PE CVD; Radio frequency plasma; Solar cell technology

Indexed keywords

DEPOSITION; MAGNETIC FIELDS; PHOTOVOLTAIC CELLS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; REACTIVE ION ETCHING; SILICON NITRIDE; SILICON WAFERS; SOLAR CELLS;

HYDROGEN PASSIVATION OF SILICON; LINEAR PLASMA SOURCES; RADIO FREQUENCY PLASMA; SOLAR CELL TECHNOLOGY;

PLASMA SOURCES;

PLASMA TREATMENT;

EID: 24644464185     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.05.020     Document Type: Article

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