Industrial large scale silicon nitride deposition on photovoltaic cells with linear microwave plasma sources

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 208-211

  Schlemm, H ^a   Mai, A ^a   Roth, S ^a   Roth, D ^a   Baumgartner K M ^b   Muegge, H ^b  

^a Roth Rau Oberflächentechnik AG   (Germany)

^b Muegge Electronic GmbH   (Germany)

Author keywords

Antireflection coating; Hydrogen passivation; Microwave plasma; PECVD process; Photovoltaic cells; Silicon nitride

Indexed keywords

CHARGE CARRIERS; MICROWAVES; PHOTOVOLTAIC CELLS; SILICON NITRIDE; THIN FILMS;

PLASMA DEPOSITION;

PLASMA SOURCES;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0041856364     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00611-X     Document Type: Article

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