Secondary RF plasma system for mitigation of EUV source debris and advanced fuels

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 852-858

  Jaworski, Michael A ^a   Williams, Michael J ^a   Antonsen, Erik L ^a   Jurczyk, Brian E ^a   Ruzic, David N ^a   Bristol, Robert ^b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Debris; EUV source; Immersed antenna; Mitigation; Secondary plasma

Indexed keywords

ARGON; DEBRIS; DENSITY (OPTICAL); FARADAY EFFECT; HELIUM; INSTALLATION; RESONATORS; ULTRAVIOLET RADIATION;

EUV SOURCES; MITIGATION; RESONATOR ANTENNA; SECONDARY PLASMA;

PLASMA SOURCES;

EID: 24644512804     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600059     Document Type: Conference Paper

References (6)

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