Evaluating advanced fuel candidates in surface cleaning of optics by plasma exposure (scope)

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 1125-1136

  Neumann, M J ^a   Shin, H ^a   Qiu, H ^a   Ritz, E ^a   DeFrees, R A ^a   Hendricks, M R ^a   Alman, D A ^a   Jurczyk, B E ^a   Ruzic, D N ^a   Bristol, R ^b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEBRIS CONTAMINATION; HELIUM HELICON PLASMA; PLASMA PARAMETERS; QUARTZ CRYSTAL MICROBALANCE;

DEBRIS; DEGRADATION; DIFFUSION; HELIUM; ION BEAMS; MORPHOLOGY; PLASMA APPLICATIONS; RUTHENIUM; SIGNAL INTERFERENCE; SURFACE ROUGHNESS;

MIRRORS;

EID: 24644436331     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600117     Document Type: Conference Paper

References (4)

1. Lopez, E.V., et al., Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources. Microelectronic Engineering, 2005. 77: p. 95-102.
2. Ruzic, D.N., Origin of Debris in EUV sources and its Mitigation, in SPIE Forthcoming Book on EUV. 2004, SPIE.
3. Jurczyk, B.E., et al., Illinois debris-mitigation EUV applications laboratory. Microelectronic Engineering, 2005. 77: p. 103-109.
4. Williams, K.R., Muller, R.S., Etch rate for Micromachining Processing. J. Microelectromechanical Sys. vol.5, no.4, Dec. 1996, pp. 256-269.