Illinois debris-mitigation EUV applications laboratory

Microelectronic Engineering

Volumn 77, Issue 2, 2005, Pages 103-109

  Jurczyk, B E ^a   Vargas Lopez, E ^a   Neumann, M N ^a   Ruzic, D N ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

Debris mitigation; Dense plasma focus; DPF; EUV; EUV source; Lithography; RF plasma

Indexed keywords

ELECTRIC DISCHARGES; LIGHT SOURCES; LITHOGRAPHY; MIRRORS; PINCH EFFECT; SPUTTER DEPOSITION; ULTRAVIOLET RADIATION;

DEBRIS MITIGATION; DENSE PLASMA FOCUS (DPF); EUV SOURCES; EXTREME ULTRAVIOLET (EUV); RF PLASMA;

PLASMA THEORY;

EID: 12444330923     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.09.006     Document Type: Article

References (9)

1. < http://www.sematech.org/resources/litho/meetings/euvl/20021014/14- Debris.pdf >, in: Proccedings of SPIE Microlithography Conference, February 2004, Santa Clara (to be published)
2. Cymer, Inc. Available from: < http://www.sematech.org/resources/litho/ meetings/euvl/20020303/04- Cymer%20020307%20ML2002Rev3.pdf >, in: Proccedings of SPIE Microlithography Conference, February 2004, Santa Clara (to be published)
3. Xtreme Technologies. Available from: < http://www.sematech.org/ resources/litho/meetings/euvl/20021014/12-Xtreme.pdf >, in: Proccedings of SPIE Microlithography Conference, February 2004, Santa Clara (to be published)
4. Philips EUV GmbH. Available from: < http://www.sematech.org/resources/ litho/meetings/euvl/20021014/09-Philips.pdf >, in: Proccedings of SPIE Microlithography Conference, February 2004, Santa Clara (to be published)
5. D.B. Hayden, D.R. Juliano, M.N. Neumann, M.M. Allain, and D.N. Ruzic Helicon plasma source for ionized physical vapor deposition Surf. Coat. Technol. 121 1999 401 404
6. K. Nakamura, Y. Kuwashita, and H. Sugai New inductive RF discharge using an internal antenna Jpn. J. Appl. Phys. 34 1995 L1686 L1688
7. J.P. Allain, and D.N. Ruzic Measurements and modeling of solid phase lithium sputtering Nucl. Fusion 42 2002 202 210
8. D.N. Ruzic Electric Probes for Low-Temperature Plasmas 1994 AVS Monograph Series New York
9. E. Vargas-Lopez, B.E. Jurczyk, D.N. Ruzic, R. Bristol, Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources, Microelectron. Eng. (2004), to be published in vol. 77