Internal oscillating current-sustained RF plasmas: Parameters, stability, and potential for surface engineering

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 796-799

  Ostrikov, K ^a,b   Tsakadze, E L ^c   Tsakadze, Z L ^b   Xu, S ^b  

^a UNIVERSITY OF SYDNEY   (Australia)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

PACVD; Plasma diagnostics; Plasma sources; Radio frequency plasma

Indexed keywords

ANTENNAS; CARRIER CONCENTRATION; PLASMA DIAGNOSTICS; PLASMA OSCILLATIONS; PLASMA PROBES; PLASMA SOURCES; PLASMA STABILITY; SURFACES; THERMAL EFFECTS;

LANGMUIR PROBES; PAVCD; RADIO FREQUENCY PLASMA;

INDUCTIVELY COUPLED PLASMA;

COATING;

EID: 24644432960     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.01.059     Document Type: Article

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