SeMATECH's world class EUV mask blank metrology toolset

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue II, 2005, Pages 893-903

  Seo, Soon Cheon ^a   Cavelaars, Jan ^a   Maltabes, John ^a   Han, Sang In ^a   Kearney, Patrick ^a   Krick, Dave ^a  

^a SEMATECH   (United States)

Author keywords

Atomic force microscope; Defect density; Defect inspection; Energy dispersive x ray; EUV reflectometer; Extreme ultraviolet lithography; Focused ion beam; Interferometer; Mask; Mo Si; Scanning electron microscope; X ray reflectivity

Indexed keywords

DEFECT DENSITY; DEFECT INSPECTION; ENERGY DISPERSIVE X-RAY; EUV REFLECTOMETER; EXTREME ULTRAVIOLET LITHOGRAPHY; FOCUSED-ION BEAMS; MASK; ULTRAVIOLET LITHOGRAPHY; X-RAY REFLECTIVE; X-RAY REFLECTIVITY;

ATOMIC FORCE MICROSCOPY; COMPUTER AIDED SOFTWARE ENGINEERING; COMPUTER SOFTWARE; DEFECTS; ENERGY DISPERSIVE SPECTROSCOPY; FAILURE ANALYSIS; INTERFEROMETERS; ION BEAMS; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY;

MEASUREMENT THEORY;

EID: 24644432101     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598860     Document Type: Conference Paper

References (8)

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3. A. Stivers, T. Liang, M. Penn, B. Lieberman, G. Shelden, J. Folta, C. Larson, P. Mirkarimi, C. Walton, E. Gullikson,and M. Yi, "Evaluation of the capability of a multibeam confocal inspection system for inspection of euvl mask blanks," Proc. SPIE Int. Soc. Eng., Vol. 4889, pp. 408-417 (R), 2002.
4. J.-P. Urbach, J. Cavelaars, H. Kusunose, T. Liang, and A. R. Stivers, "EUV substrate and blank inspection with confocal microscopy," Proc. SPIE Int. Soc. Eng., Vol. 5256, pp. 556-565, 2003.
5. E. Spiller in Soft X-ray Optics (SPIE Optical Engineering Press, Bellingham, Washington, 1994) p. 272.
6. rd, 2004.
7. P. Seidel, "EUV Mask Blank Readiness for 45nm HP 2009 Manufacturing," Emerging Lithographic Technologies IX, SPIE Microlithography, Vol 5751-17, 2005.
8. A. MacKenzie, R. Laubmeier, A. Oberai, S. Shaikh, G. Stockmann, "Yield Mask: the latest developments and their application in a Mask House Production Environment," Proc. SPIE Int. Soc. Eng., Vol. 5256, pp. 449-460, 2003.