Yield Mask: The latest developments and their application in a Mask House production environment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 449-460

  MacKenzie, Annemarie ^a   Laubmeier, Rudolf ^a   Oberai, Ankush ^b   Shaikh, Sana ^b   Stockmann, Gerd ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b FEI Knights Division   (United States)

Author keywords

Analysis; Defects; Software; Yield Management

Indexed keywords

AUTOMATION; COMPUTER SOFTWARE; DATA REDUCTION; DATABASE SYSTEMS; DEFECTS; INSPECTION; MAINTENANCE; REPAIR; SAMPLING; SCANNING ELECTRON MICROSCOPY; STANDARDIZATION;

MASK PRODUCTION; YIELD MANAGEMENT;

MASKS;

EID: 1842527125     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.517083     Document Type: Conference Paper

References (5)

1. th January 2003, Sonthofen, Germany, Vol 39, pp 269-278
2. nd Annual BACUS Symposium on Photomask Technology, Eds. B.J. Grenon and K.R. Kimmel, Vol. 4889, pp. 1-14, 2002
3. nd Annual BACUS Symposium on Photomask Technology, Eds. B.J. Grenon and K.R. Kimmel, Vol. 4889, pp. 263-270, 2002
4. nd Annual BACUS Symposium on Photomask Technology, Eds. B.J. Grenon and K.R. Kimmel, Vol. 4889, pp. 1001-1009, 2002
5. nd Annual BACUS Symposium on Photomask Technology, Eds. B.J. Grenon and K.R. Kimmel, Vol. 4889, pp. 271-282, 2002