Electron field emission from self-organized micro-emitters of sp 3-bonded 5H Boron nitride with very high current density at low electric field

Journal of Physical Chemistry B

Volumn 108, Issue 17, 2004, Pages 5182-5184

  Komatsu, Shojiro ^a   Okudo, Akio ^b   Kazami, Daisuke ^b   Golberg, Dmitri ^a   Li, Yubao ^a   Moriyoshi, Yusuke ^b   Shiratani, Masaharu ^c   Okada, Katsuyuki ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b HOSEI UNIVERSITY   (Japan)

^c KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOTUBES; CHEMICAL BONDS; CURRENT DENSITY; ELECTRIC FIELDS; ELECTRON EMISSION; LASER BEAM EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY;

ELECTRON EMITTING DEVICES; ELECTRON FIELS EMISSION; MICRO-EMITTERS; NEGATIVE ELECTRON AFFINITY (NEA);

CUBIC BORON NITRIDE;

EID: 2442547237     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0493475     Document Type: Article

References (23)

1. Himpsel, F. J.; Knapp, J. A.; Van Vechten; Eastman, D. E. Phys. Rev. B 1979, 20, 624.
2. Nemanich, R. J.; Baumann, P. K.; Benjamins, M. C.; King, S. W.; van der Weide; Davis, R. F. Dia., Relat. Mater. 1996, 5, 790.
3. Bozeman, S. P.; Baumann, P. K.; Ward, B. L.; Powers, M. J.; Cuomo, J. J.; Nemanich, R. J.; Dreifus, D. L. Dia., Relat. Mater. 1996, 5, 802.
4. Lee, S.-B.; The, A. S.; Teo, K. B. K.; Chhowalla, M.; Hasko, D. G.; Milne, W. I.; Amaratunga, G. A. J.; Ahmed, H. Nonotehnology 2003, 14, 192.
5. Teo, K. B. K.; Chhowalla, M.; Amaratunga, G. A. J.; Milne, W. I.; Pirio, G.; Legagneux, P.; Wyczisk, F.; Pribat, D.; Hasko, D. G. Appl. Phys. Lett. 2002, 80, 2011.
6. Komatsu, S.; Okada, K.; Shimizu, Y.; Moriyoshi, Y. J. Phys. Chem. B 1999, 103, 3289.
7. Komatsu, S.; Kurashima, K.; Kanda, H.; Okada, K.; Moriyoshi, Y.; Shimizu, Y.; Shiratani, M.; Nakano, T.; Samukawa, S. Appl. Phys. Lett. 2002, 81, 4547.
8. Li, Y. B.; Band, Y.; Golberg, D. Appl. Phys. Lett. 2003, 82, 1962.
9. Kirihara, H.; Uda, M. Rev. Sci. Instrum. 1981, 52, 68.
10. Zhu, W.; Bower, C.; Zhou, O.; Kochanski, G.; Jin, S. Appl. Phys. Lett. 1999, 75, 873.
11. Fan, S.; Chapline, M. G.; Franklin, N. R.; Tombler, T. W.; Cassell, A. M.; Dai, H. Science 1999, 283, 512.
12. Murakami, H.; Hirakawa, M.; Tanaka, C.; Yamakawa, H. Appl. Phys. Lett. 2000, 76, 1776-1778.
13. Badi, N.; Tempez, A.; Starikov, D.; Bensaoula, A.; Ageev, V. P.; Karabutov, A.; Ugarov, M. V.; Frolov, V.; Loubnin, E.; Waters, K.; Shultz, A. J. Vac. Sci. Technol. A 1999, 17, 1191.
14. Gomer, R. Field Emission and Field Ionization; Harvard University Press: Cambridge, MA, 1961.
15. Nilsson, L.; Groening, O.; Emmenegger, C.; Kuettel, O.; Schaller, E.; Schlapbach, L.; Kind, H.; Bonard, J.-M.; Kern, K. Appl. Phys. Lett. 2000, 76, 2071.
16. Ballantyne, J. M. Phys. Rev. B 1972, 6, 1436.
17. Komatsu, S.; Kasamatsu, M.; Yamada, K.; Moriyoshi, Y. Appl. Phys. Lett. 1991, 59, 608.
18. Komatsu, S.; Kasamatsu, M.; Yamada, K.; Moriyoshi, Y. J. Appl. Phys. 1992, 71, 5654.
19. Komatsu, S. J. Mater. Res. 1997, 12, 1675.
20. Powers, M. J.; Benjamin, M. C.; Porter, L. M.; Nemanich, R. J.; Davis, R. F.; Cuomo, J. J.; Doll, G. L.; Harris, S. J. Appl. Phys. Lett. 1995, 67, 3912.
21. Pryor, R. W. Appl. Phys. Lett. 1996, 68, 1802.
22. Loh, K. P.; Nishitani-Gamo, M.; Sakaguchi, I.; Taniguchi, T.; Ando, T. Appl. Phys. Lett. 1998, 72, 3023.
23. Komatsu, S.; Yarbrough, W.; Moriyoshi, Y. J. Appl. Phys. 1997, 87, 7798.