Use of grazing angle sputtering for improving depth resolution in high resolution RBS

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 219-220, Issue 1-4, 2004, Pages 369-372

  Sakai, W ^a   Nakajima, K ^a   Suzuki, M ^a   Kimura, K ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Depth resolution; Grazing angle sputtering; High resolution RBS

Indexed keywords

INTERFACES (MATERIALS); IRRADIATION; SILICA; SILICON WAFERS; SPECTROMETERS; XENON;

DEPTH RESOLUTION; GRAZING ANGLE SPUTTERING; SURFACE LAYERS;

RUTHERFORD BACKSCATTERING SPECTROSCOPY;

EID: 2442519117     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.01.084     Document Type: Conference Paper

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