Preparation of smooth Si(0 0 1) surfaces by glancing angle sputtering

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 148, Issue 1-4, 1999, Pages 149-153

  Kimura, Kenji ^a   Fukui, Akira ^a   Nakajima, Kaoru ^a   Mannami, Michi Hiko ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

AFM; Fractal; Sputtering; Surface smoothing

Indexed keywords

ATOMIC FORCE MICROSCOPY; FRACTALS; GALLIUM; ION BEAMS; ION BOMBARDMENT; RADIATION EFFECTS; SPUTTERING; SURFACE ROUGHNESS;

GLANCING ANGLE SPUTTERING; SURFACE SMOOTHING;

SILICON;

EID: 0033513866     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00697-1     Document Type: Article

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