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Volumn 25, Issue 5, 2004, Pages 286-288

Bandwidth enhancement in an integratable SiGe phototransistor by removal of excess carriers

Author keywords

Bandwidth; Nonideal (nkT) base current; SiGe

Indexed keywords

AMPLIFICATION; CHARGE CARRIERS; ELECTRIC CURRENTS; ELECTRON TRAPS; HETEROJUNCTION BIPOLAR TRANSISTORS; OPTOELECTRONIC DEVICES; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE STRUCTURES;

EID: 2442428490     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2004.826975     Document Type: Letter
Times cited : (34)

References (10)
  • 1
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    • High efficient 850-nm and 1310-nm multiple quantum well SiGe-Si heterojunction phototransistors with 1.25-plus GHz bandwidth (850 nm)
    • Z. Pei, C. S. Liang, L. S. Lai, Y. T. Tseng, Y. M. Hsu, P. S. Chen, S. C. Lu, C. M. Liu, M.-J. Tsai, and C. W. Liu, "High efficient 850-nm and 1310-nm multiple quantum well SiGe-Si heterojunction phototransistors with 1.25-plus GHz bandwidth (850 nm)," in IEDM Tech. Dig., 2002, pp. 297-300.
    • IEDM Tech. Dig., 2002 , pp. 297-300
    • Pei, Z.1    Liang, C.S.2    Lai, L.S.3    Tseng, Y.T.4    Hsu, Y.M.5    Chen, P.S.6    Lu, S.C.7    Liu, C.M.8    Tsai, M.-J.9    Liu, C.W.10
  • 5
    • 0029253480 scopus 로고
    • Analysis of ultrafast photocarrier transport in AlInAs-GaInAs heterojunction bipolar transistors
    • Feb.
    • M. Y. Frankel, T. F. Carruthers, and C. S. Kyono, "Analysis of ultrafast photocarrier transport in AlInAs-GaInAs heterojunction bipolar transistors," IEEE J. Quantum Electron., vol. 31, pp. 278-285, Feb. 1995.
    • (1995) IEEE J. Quantum Electron. , vol.31 , pp. 278-285
    • Frankel, M.Y.1    Carruthers, T.F.2    Kyono, C.S.3
  • 7
    • 21544456769 scopus 로고
    • Degradation of bipolar transistors under high current stress at 300 K
    • R. A. Wachnik, T. J. Bucelot, and G. P. Li, "Degradation of bipolar transistors under high current stress at 300 K," J. Appl. Phys., vol. 63, p. 4734, 1988.
    • (1988) J. Appl. Phys. , vol.63 , pp. 4734
    • Wachnik, R.A.1    Bucelot, T.J.2    Li, G.P.3
  • 8
    • 0037004342 scopus 로고    scopus 로고
    • A new 'mixed-mode' reliability degradation mechanism in advanced Si and SiGe bipolar transistors
    • Dec.
    • G. Zhang, J. D. Cressler, G. Niu, and A. Joseph, "A new 'mixed-mode' reliability degradation mechanism in advanced Si and SiGe bipolar transistors," IEEE Trans. Electron Devices, vol. 49, pp. 2151-2156, Dec. 2002.
    • (2002) IEEE Trans. Electron Devices , vol.49 , pp. 2151-2156
    • Zhang, G.1    Cressler, J.D.2    Niu, G.3    Joseph, A.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.