Improved anti-adhesive coating for nanoimprint lithography by co-evaporation of fluorinated mono- and trichlorosilanes

Materials Research Society Symposium Proceedings

Volumn EXS, Issue 2, 2004, Pages 37-39

  Park, S ^a   Schift, H ^a   Padeste, C ^a   Schnyder, B ^a   Gobrecht, J ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESIVES; EVAPORATION; FLUORINE CONTAINING POLYMERS; INTERFACIAL ENERGY; LAYERED MANUFACTURING; LITHOGRAPHY; MOLECULAR STRUCTURE; POLYMERIZATION; SEMICONDUCTING SILICON; SILANES; STAMPING; SURFACES;

ANTI-ADHESIVE COATING; CO-EVAPORATION; NANOIMPRINT LITHOGRAPHY (NI); TRICHLOROSILANES;

COATING TECHNIQUES;

EID: 23844472257     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. R.W. Jaszewski, H. Schift, B. Schnyder, A. Schneuwly and P. Gröning, Applied Surface Science 143 301 (1999).
2. M. Beck, M. Graczyk, I. Maximov, E.-L. Sarwe, T.G.I. Ling, M. Keil, L. Montelius, Microelctron. Eng. 61-62 442 (2002).
3. F. Schreiber, Prog. Surf. Sci. 65 151 (2002).
4. Manual of contact angle measurement systems (G2), Krüss GmbH pp. 131.