Characterisation of dopants distribution using electron holography and FIB-based lift-off preparation

Microelectronics Reliability

Volumn 45, Issue 9-11, 2005, Pages 1558-1561

  Muehle, U ^a   Lenk, A ^b   Weiland, R ^a   Lichte, H ^b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DOPANTS; DUAL-BEAM TOOL; ELECTROSTATIC POTENTIAL; LIFT-OUT TECHNIQUES;

DOPING (ADDITIVES); ELECTROSTATICS; SEMICONDUCTOR MATERIALS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON HOLOGRAPHY;

EID: 24144454670     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2005.07.043     Document Type: Conference Paper

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