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Volumn , Issue , 2004, Pages 324-330
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Grafting FIB "Lift-out" TEM sample for further ion milling and its application for semiconductor devices
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Author keywords
[No Author keywords available]
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Indexed keywords
DEPOSITION;
GRAFTING (CHEMICAL);
IMAGE QUALITY;
ION BEAMS;
SEMICONDUCTOR DEVICES;
TUNGSTEN;
FOCUSED ION BEAMS (FIB);
LIFT OUT TECHNIQUES (LO);
WEDGE-POLISHED (WP) SAMPLES;
TRANSMISSION ELECTRON MICROSCOPY;
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EID: 10444271065
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (2)
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References (11)
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