Metalizable polymer thin films in supercritical carbon dioxide

Journal of Adhesion

Volumn 81, Issue 7-8, 2005, Pages 751-764

  Koga, Tadanori ^a   Jerome, J L ^a   Rafailovich, M H ^a   Sokolov, J C ^a   Gordon, C ^b  

^a Stony Brook University   (United States)

^b Half Hollow Hills School District   (United States)

Author keywords

Atomic force microscopy; Contact angle; Interfacial width; Polymer thin films; Supercritical carbon dioxide; Vapor metal deposition; X ray reflectivity

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CARBON DIOXIDE; CHROMIUM; CONTACT ANGLE; INTERFACES (MATERIALS); MORPHOLOGY; POLYMETHYL METHACRYLATES; POLYSTYRENES; THIN FILMS; VAPOR DEPOSITION;

INTERFACIAL WIDTH; POLYMER THIN FILMS; SUPERCRITICAL CARBON DIOXIDE; VAPOR METAL DEPOSITION; X RAY REFLECTIVITY;

ADHESION;

EID: 24044507359     PISSN: 00218464     EISSN: None     Source Type: Journal    
DOI: 10.1080/00218460500187764     Document Type: Article

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