Spatially selective metal deposition into a hole-array structure of anodic porous alumina using a microelectrode

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 37, Issue 9 PART A/B, 1998, Pages

  Masuda, Hideki ^a   Yotsuya, Masato ^a   Ishida, Masaya ^b  

^a TOKYO METROPOLITAN UNIVERSITY   (Japan)

^b SEIKO EPSON CORPORATION   (Japan)

Author keywords

Anodic porous alumina; Electrodeposition; Hole array structure; Microelectrode

Indexed keywords

ANODIC OXIDATION; DISSOLUTION; ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; ELECTRONIC STRUCTURE; HOLE TRAPS; NICKEL; POROUS MATERIALS; SCANNING ELECTRON MICROSCOPY;

ANODIC POROUS ALUMINA; HOLE ARRAY STRUCTURE; MICROELECTRODE; SPATIALLY SELECTIVE METAL DEPOSITION;

ALUMINA;

EID: 0032154662     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.l1090     Document Type: Article

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