Complexity reduction of a thin film deposition model using a trajectory based nonlinear model reduction technique

Proceedings of the American Control Conference

Volumn 4, Issue , 2005, Pages 2566-2571

  Wolfrum, Philipp ^a   Vargas, Alejandro ^b   Gallivan, Martha ^c   Allgöwer, Frank ^d  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^c Georgia Institute of Technology   (United States)

^d UNIVERSITY OF STUTTGART   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL COMPLEXITY; CRYSTAL LATTICES; CRYSTAL ORIENTATION; DEPOSITION; GERMANIUM; IDENTIFICATION (CONTROL SYSTEMS); NONLINEAR SYSTEMS; PARAMETER ESTIMATION; SURFACE ROUGHNESS;

FREQUENCY DOMAIN IDENTIFICATION; KINETIC MONTE CARLO (KMC); SELECTION TECHNIQUES; THREE ORDERS OF MAGNITUDE;

THIN FILMS;

EID: 23944495150     PISSN: 07431619     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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