Investigation of C49-C54 TiSi2 transformation kinetics

Microelectronic Engineering

Volumn 50, Issue 1-4, 2000, Pages 153-158

  Ottaviani, G ^a   Tonini, R ^a   Giubertoni, D ^a   Sabbadini, A ^b   Marangon, T ^b   Queirolo, G ^b   La Via, F ^c  

^a Via Campi 213 a   (Italy)

^b STMICROELECTRONICS   (Italy)

^c CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CRYSTAL GROWTH; ELECTRIC RESISTANCE MEASUREMENT; HEAT TREATMENT; ION IMPLANTATION; NUCLEATION; PHASE TRANSITIONS; SEMICONDUCTOR GROWTH; SPECTROMETRY; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

BACKSCATTERING SPECTROMETRY; POLYMORPHIC TRANSFORMATIONS; TITANIUM DISILICIDE;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0033639799     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00276-2     Document Type: Article

References (9)

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