Microstructural study on the C49-to-C54 phase transformation in TiSi2 formed from preamorphization implantation

Journal of Applied Physics

Volumn 85, Issue 5, 1999, Pages 2988-2990

  Okihara, M ^a   Hirashita, N ^a   Tai, K ^a   Kageyama, M ^a   Harada, Y ^a   Onoda, H ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001729747     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369615     Document Type: Article

References (11)

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