High-rate growth of films of dense, aligned double-walled carbon nanotubes using microwave plasma-enhanced chemical vapor deposition

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 20-23, 2005, Pages

  Hiramatsu, Mineo ^a   Nagao, Hidetoshi ^a   Taniguchi, Masaki ^a   Amano, Hiroshi ^a   Ando, Yoshinori ^a   Hori, Masaru ^b  

^a MEIJO UNIVERSITY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Aligned; Carbon naotube; Co catalyst; Double walled CNT; High growth rate; Plasma enhanced CVD

Indexed keywords

CATALYSTS; COBALT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; THIN FILMS; TITANIUM NITRIDE;

ALIGNED; CATALYTIC COBALT (CO); CO CATALYSTS; DOUBLE-WALLED CARBON NANOTUBES; HIGH GROWTH RATES;

CARBON NANOTUBES;

EID: 23944483941     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.L693     Document Type: Article

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