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Volumn , Issue , 2003, Pages 737-743
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Integration of atomic layer deposition of TaN barriers in dual damascene SiOC
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC LAYER DEPOSITION (ALD);
CONFORMATION DEPOSITION;
DAMASCENE;
TAN BARRIERS;
METALLIZING;
PHYSICAL VAPOR DEPOSITION;
SILICON COMPOUNDS;
THICKNESS CONTROL;
THICKNESS MEASUREMENT;
TRANSMISSION ELECTRON MICROSCOPY;
TANTALUM COMPOUNDS;
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EID: 23844525132
PISSN: 15401766
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (9)
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References (6)
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