Repairing process-induced damage to porous low-k ILDs by post-ash treatment

Advanced Metallization Conference (AMC)

Volumn , Issue , 2003, Pages 519-523

  Bhanap, Anil ^a   Ramos, Teresa ^b   Camarena, Anna ^a   Naman, Ananth ^a  

^a HONEYWELL   (United States)

^b NanoPore   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLANKET FILMS; COPPER ANNEALING PROCESS; SPIN-ON-DIELECTRIC (SOD) COATERS; THERMAL DESORPTION MASS SPECTROSCOPY (TDMS);

CARBON; ELLIPSOMETRY; HYDROPHOBICITY; MASS SPECTROMETRY; PERMITTIVITY; PHOTORESISTS; REFRACTIVE INDEX; THERMODYNAMIC STABILITY;

POROUS MATERIALS;

EID: 23844508879     PISSN: 15401766     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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