Geometry-dependent stripe rearrangement processes induced by strain on preordered microwrinkle patterns

Langmuir

Volumn 21, Issue 16, 2005, Pages 7230-7237

  Ohzono, Takuya ^a   Shimomura, Masatsugu ^a,b  

^a Discovery Research Institute   (Japan)

^b HOKKAIDO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MORPHOLOGY; PERTURBATION TECHNIQUES; STRAIN; SURFACE TREATMENT; VECTORS; VISCOELASTICITY;

MICROPATTERNING; NANOPATTERNING; PARALLELOGRAM; STRAIN ORIENTATIONS;

ELASTOMERS;

BAYSILON; DIMETICONE; SILICONE DERIVATIVE;

ARTICLE; CHEMISTRY; CONFORMATION; IMAGE PROCESSING; MECHANICAL STRESS; METHODOLOGY; MICROSCOPY; PHYSICS; SURFACE PROPERTY;

DIMETHYLPOLYSILOXANES; IMAGE PROCESSING, COMPUTER-ASSISTED; MICROSCOPY; MOLECULAR CONFORMATION; PHYSICS; SILICONES; STRESS, MECHANICAL; SURFACE PROPERTIES;

EID: 23844474867     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0503449     Document Type: Article

References (33)

1. Ibn-Elhaj, M.; Schadt, M. Nature 2001, 410, 796.
2. Campbell, C. J.; Klajn, R.; Fialkowski, M.; Grzybowski, B. A. Langmuir 2005, 21, 418.
3. Jiang, X.; Takayama, S.; Qian, X.; Ostuni, E.; Wu, H.; Bowden, N.; LeDuc, P.; Ingber, D. E.; Whitesides, G. M. Langmuir 2002, 18, 3273.
4. Nishikawa, T.; Ookura, R.; Nishida, J.; Arai, K.; Hayashi, J.; Kurono, N.; Sawadaishi, T.; Hara, M.; Shimomura, M. Langmuir 2002, 18, 5734.
5. Cross, M. C.; Hohenberg, P. C. Rev. Mod. Phys. 1993, 65, 851.
6. Seul, M.; Andelman, D. Science 1995, 267, 476.
7. Bowman, C.; Newell, A. C. Rev. Mod. Phys. 1998, 70, 289.
8. Ball, P. The Self-Made Tapestry; Oxford University Press: New York, 2001.
9. Rabinovich, M. I.; Ezersky, A. B.; Weidman, P. D. The Dynamics of Patterns; World Scientific: Singapore, 2000.
10. Möhwald, H. Thin Solid Films 1988, 159, 1.
11. Seul, M.; Wolfe, R. Phys. Rev. Lett. 1992, 68, 2460.
12. Harrison, C.; Adamson, D. H.; Cheng, Z.; Sebastian, J. M.; Sethuraman, S.; Husse, D. A.; Register, R. A.; Chaikin, P. M. Science 2000, 290, 1558.
13. Higgins, A. M.; Jones, R. A. L. Nature 2000, 204, 476.
14. Shimomura, M.; Sawadaishi, T. Curr. Opin. Colloid Interface Sci. 2001, 6, 11.
15. Sharp, J. S.; Jones, R. A. L. Adv. Mater. 2002, 14, 799.
16. Bowden, N.; Brittain, S.; Evans, A. G.; Hutchinson, J. W.; Whitesides, G. M. Nature 1998, 393, 146.
17. Bowden, N.; Huck, W. T. S.; Paul, K. E.; Whitesides, G. M. Appl. Phys. Lett. 1999, 75, 2557.
18. Chua, D. B. H.; Ng, H. T.; Li, S. F. Y. Appl. Phys. Lett. 2000, 76, 721.
19. Huck, W. T. S.; Bowden, N.; Onck, P.; Pardoen, T.; Hutchinson, J. W.; Whitesides, G. M. Langmuir 2000, 16, 3497.
20. Ohzono, T.; Shimomura, M. Phys. Rev. B. 2004, 69, 132202.
21. Moldovan, D.; Golubovic, L. Phys. Rev. Lett. 1999, 82, 2884.
22. Sridhar, N.; Srolovitz, D. J.; Suo, Z. Appl. Phys. Lett. 2001, 78, 2482.
23. Huang, R.; Suo, Z. J. Appl. Phys. 2002, 91, 1135.
24. Yoo, P. J.; Lee, H. H. Phys. Rev. Lett. 2003, 91, 154502.
25. Yoo, P. J.; Suh, K. Y.; Kang, H.; Lee, H. H. Phys. Rev. Lett. 2004, 93, 34301.
26. Huang, Z.; Hong, W.; Suo, Z. Phys. Rev. E 2004, 70, 30601(R).
27. Stafford, C. M.; Harrison, C.; Beers, K. L.; Karim, A.; Amis, E. J.; Vanlandingham, M. R.; Kim, H.; Volksen, W.; Miller, R. D.; Simonyi, E. E. Nat. Mater. 2004, 3, 545.
28. Harrison, C.; Stafford, C. M.; Zhang, W.; Karim, A. Appl. Phys. Lett. 2004, 85, 4016.
29. Uchida, N. Physica D 2005, in press.
30. Ohzono, T.; Shimomura, M. Jpn. J. Appl. Phys. 2005, 44, 1055.
31. Egolf, D. A.; Melnikov, I. V.; Bodenschatz, E. Phys. Rev. Lett. 1998, 80, 3228.
32. Bazen, A. M.; Gerez, S. H. IEEE Trans. Pattern Anal. Mach. Intell. 2002, 24, 905.
33. Ghosh, S. K.; Ramberg, H. Tectonophysics 1968, 5, 89.