Formation of hydrogen-passivated silicon nanochains by pulsed laser ablation without thermal annealing

Materials Research Society Symposium Proceedings

Volumn 832, Issue , 2005, Pages 341-345

  Inada, Mitsuru ^a   Umezu, Ikurou ^b   Tanaka, Shukichi ^a   Mashiko, Shinro ^a   Sugimura, Akira ^b  

^a NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY   (Japan)

^b KONAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLINE MATERIALS; HYDROGEN; LASER ABLATION; PASSIVATION; PULSED LASER APPLICATIONS; SILICON; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY;

HYDROGEN PASSIVATION; NANOCHAINS; PULSED LASER ABLATION; THERMAL ANNEALING;

NANOSTRUCTURED MATERIALS;

EID: 23844450008     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)

1. L. T. Canham, Appl. Phys. Lett. 57, 1046 (1990).
2. D. J. Lockwood, "Light Emission in Silicon From Physics to Devices" ed. by D. J. Lockwood (Academic Press, San Diego 1998).
3. E. Werwa, A. A. Seraphin, L. A. Chiu, C. Zhou, K. D. Kolenbrander, App. Phys. Lett. 64, 1821 (1994).
4. Y. Yamada, T. Orii, I. Umezu, S. Takeyama and T. Yoshida, Jpn. J. Appl. Phys. 35, 1361 (1996).
5. M. Inada, I. Umezu and A. Sugimura, J. Vac. Sci. Technol. A 21, 84 (2003)
6. M. Inada, H. Nakagawa, I. Umezu and A. Sugimura, Meterials Science and Engineering B 101, 283 (2003)
7. Umezu, K. Matsumoto, M. Inada, T. Makino and A. Sugimura, Appl. Phys. A 79, 1545 (2004).
8. I. H. Campbell and P. M. Fauchet, Solid State Commun. 58, 739 (1986).
9. S. Piscanec, M. Cantoro, A. C. Ferrari, J. A. Zapien, Y. Lifshitz, S. T. Lee, S. Hofmann and J. Robertson, Phys. Rev. B 68, 241312 (2003).
10. S. P. Withrow, C. W. While, A. Meldrum, J. D. Budai, D. M. Hembree, Jr., J. C. Barbour, J. Appl. Phys. 86, 396 (1999).