Analysis of stability and accuracy in fluid simulations using the dielectric relaxation scheme of high density inductively coupled plasma sources

Journal of the Korean Physical Society

Volumn 47, Issue 1, 2005, Pages 163-166

  Kwon, Deuk Chul ^a   Yoon, N S ^a   Kim, J H ^b   Shin, Y H ^b   Chung, K H ^b  

^a Chungbuk National University   (South Korea)

^b Korea Research Institute of Standards and Science   (South Korea)

Author keywords

Fluid simulation; Numerical method; Plasma

Indexed keywords

EID: 23744504529     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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7. S. S. Kim, S. Hamaguchi, N. S. Yoon, C. S. Chang, Y. D. Lee and S. H. Ku, Phys. Plasmas 8, 1384 (2001).