메뉴 건너뛰기




Volumn 170, Issue 2, 2001, Pages 550-561

A New Unconditionally Stable Algorithm for Steady-State Fluid Simulation of High Density Plasma Discharge

Author keywords

Fluid; Numerical method; Perturbation; Simulation

Indexed keywords

ELECTRIC DISCHARGES; INDUCTIVELY COUPLED PLASMA; PERTURBATION TECHNIQUES;

EID: 0013000959     PISSN: 00219991     EISSN: None     Source Type: Journal    
DOI: 10.1006/jcph.2001.6748     Document Type: Article
Times cited : (24)

References (8)
  • 1
    • 0003568792 scopus 로고
    • Design of high-density plasma sources for material processing
    • edited by M. H. Francombe and J. L. Vossen, Academic Press, New York
    • M. A. Lieberman and R. A. Gottscho, Design of high-density plasma sources for material processing, in Physics of Thin Films, edited by M. H. Francombe and J. L. Vossen, (Academic Press, New York, 1994), Vol. 18.
    • (1994) Physics of Thin Films , vol.18
    • Lieberman, M.A.1    Gottscho, R.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.