Flash lamp annealing technology for ultra-shallow junction formation

Extended Abstracts of the 3rd International Workshop on Junction Technology, IWJT 2002

Volumn , Issue , 2002, Pages 23-26

  Ito, T ^a   Suguro, K ^a   Tamura, M ^b   Taniguchi, T ^a   Ushiku, Y ^a   Iinuma, T ^a   Itani, T ^a   Yoshioka, M ^c   Owada, T ^c   Imaoka, Y ^d   Murayama, H ^d   Kusuda, T ^d  

^a TOSHIBA CORPORATION   (Japan)

^b Toshiba IS Corporation   (Japan)

^c USHIO INC   (Japan)

^d DAINIPPON SCREEN MFG CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84963569049     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IWJT.2002.1225191     Document Type: Conference Paper

References (4)

1. 2001 ITRS Roadmap (http://www.public.itrs.net).
2. T. Ito et al., Ext. Abstr. of SSDM, pp 182-183, Tokyo, 2001.
3. T. Ito et al., Jpn. J. Appl. Phys. vol. 41, pp 2394-2398, April 2002.
4. T. Ito et al., to be presented in ISSM2002 (October 15-17, 2002 in Tokyo).