Fabrication of silicon dioxide nanocapillary arrays for guiding highly charged ions

Nanotechnology

Volumn 16, Issue 9, 2005, Pages 1697-1700

  Kumar, R T Rajendra ^a,c   Badel, X ^b   Vikor, G ^a   Linnros, J ^b   Schuch, R ^a  

^a STOCKHOLM UNIVERSITY   (Sweden)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^c DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; CAPILLARITY; ELECTROCHEMISTRY; ETCHING; FABRICATION; LITHOGRAPHY; NANOSTRUCTURED MATERIALS;

CHARGED IONS; ELECTROCHEMICAL ETCHING; NANOCAPILLARY ARRAY; PORE ARRAYS;

SILICA;

EID: 23444453673     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/9/048     Document Type: Article

References (11)

1. Letant S E, Hart B R, Van Buuren A W and Terminello L J 2003 Nat. Mater. 2 395
2. Anderson R C, Bogdan G J, Barniv Z, Dawes T D, Winkler J and Roy K 1997 Proc. Transducers 97 477
3. Stolterfoht N, Bremer J H, Hellhammer R, Fink D, Petrov A and Sulik B 2002 Phys. Rev. Lett. 88 133201
4. Schenkel T et al 2002 J. Vac. Sci. Technol. B 20 2819
5. Schenkel T et al 2003 J. Appl. Phys. 94 7017
6. Lehmann V and Foll H 1990 J. Electrochem. Soc. 137 653
7. Lehmann V 1993 J. Electrochem. Soc. 140 2836
8. Foll H, Christophersen M, Carstensen J and Haasse G 2002 Mater. Sci. Eng. R 39 93
9. Badel X, Rajendra Kumar R T, Kleimann P and Linnros J 2004 Superlatt. Microstruct. 36 245
10. Yamazaki Y 2002 Nucl. Instrum. Methods B 193 516
11. Arnau A et al 1997 Surf. Sci. Rep. 27 113