Influence of film characteristics on the sputtering rate of MgO

IEICE Transactions on Electronics

Volumn E82-C, Issue 10, 1999, Pages 1804-1807

  Hidaka, Souichirou ^a   Ishimoto, Manabu ^a   Iwase, Nobuhiro ^a   Betsui, Keiichi ^a   Inoue, Hiroshi ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Density; Mgo; PDF; Sputtering

Indexed keywords

EID: 0001509720     PISSN: 09168524     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (3)

1. M. Ishimoto, Analysis of secondary electron emission yield of MgO thin film, IEEE Technical Report, EID-98-107, 1999.
2. M. Ishimoto, ''Secondary electron emission analysis of MgO films for protecting layer of AC plasma display, SID'99, Digest, pp. 552-555, May 1999.
3. M. Harris, H. A. Maclcod, and S. Ogura, ''The relationship between optical inhomogeneity and film structure, Thin Solid Films, vol. 57, pp. 173-178, 1979.