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Volumn 44, Issue 9, 2001, Pages 808-814
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Thin Film Formation by using New Facing Targets Sputtering Apparatus
a
a
FTS Corporation
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 77952724773
PISSN: 05598516
EISSN: None
Source Type: Journal
DOI: 10.3131/jvsj.44.808 Document Type: Article |
Times cited : (3)
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References (7)
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