Femtosecond pulsed laser ablation of metal alloy and semiconductor targets

Applied Surface Science

Volumn 229, Issue 1-4, 2004, Pages 268-274

  Trelenberg, T W ^a   Dinh, L N ^a   Stuart, B C ^a   Balooch, M ^a,b  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Ablation; CoPt; Femtosecond; GaAS; Inconel; Laser; Vapor pressure

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONTAMINATION; NANOSTRUCTURED MATERIALS; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM PHOSPHIDE; STOICHIOMETRY; VAPOR PRESSURE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON-PHOTON COUPLING; FEMTOSECOND; INCONEL; VACUUM CHAMBER;

COBALT ALLOYS;

EID: 2342569611     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.02.002     Document Type: Article

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