Thin Film 193nm TNK Measurement using Multi-domain Genetic Algorithm (MDGA) with a Combination of Beam Profile Reflectometry (BPR™), Absolute Effipsometry (AE™), and Spectroscopic Ellipsometry (SE)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5188, Issue , 2003, Pages 6-18

  Opsal, Jon ^a   Leng, Jingmin ^a   Ke, Chih Ming ^b   Chen, Pei Hung ^b   Chen, Jeng Horng ^b   Ku, Yao Ching ^b  

^a Therma Wave Inc   (United States)

^b TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Absolute Ellipsometry (AE ); Anti Reflective Coating (ARC); Beam Profile Reflectometry (BPR ); Critical Dimension Uniformity (CDU); Multi Domain Genetic Algorithm (MDGA); Silicon oxynitride (SION); Spectroscopic Ellipsometry (SE)

Indexed keywords

ABSOLUTE ELLIPSOMETRY (AE™); ANTI-REFLECTIVE COATING (ARC); BEAM PROFILE REFLECTOMETRY (BPR™); CRITICAL DIMENSION UNIFORMITY (CDU); MULTI-DOMAIN GENETIC ALGORITHM (MDGA); SILICON OXYNITRIDE (SION); SPECTROSCOPIC ELLIPSOMETRY (SE);

ELLIPSOMETRY; GENETIC ALGORITHMS; LIGHT EXTINCTION; LITHOGRAPHY; PERMITTIVITY; REFLECTOMETERS; REFRACTIVE INDEX; SILICON;

THIN FILMS;

EID: 2342538450     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.507466     Document Type: Conference Paper

References (6)

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