Simultaneous measurement of six layers in a silicon on insulator film stack using spectrophotometry and beam profile reflectometry

Journal of Applied Physics

Volumn 81, Issue 8, 1997, Pages 3570-3578

  Leng, J M ^a   Sidorowich, J J ^a   Yoon, Y D ^a   Opsal, J ^a   Lee, B H ^b   Cha, G ^b   Moon, J ^b   Lee, S I ^b  

^a Therma Wave Inc   (United States)

^b SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000214583     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.364994     Document Type: Article

References (11)

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