Noble gas influence on reactive radio frequency magnetron sputter deposition of TiN films

Vacuum

Volumn 51, Issue 4, 1998, Pages 635-640

  Lungu, C P ^a,b   Futsuhara, M ^a,c   Takai, O ^a   Braic, M ^d   Musa, G ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

^c Nippon Paint Co Ltd ^*  (Japan)

^d NATIONAL INSTITUTE FOR OPTOELECTRONICS   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

HELIUM; MAGNETRON SPUTTERING; NEON; PLASMAS; SPUTTER DEPOSITION; THIN FILMS;

REACTIVE RADIO FREQUENCY MAGNETRON SPUTTER DEPOSITION;

TITANIUM NITRIDE;

EID: 0032319991     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00264-4     Document Type: Article

References (6)

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2. Skerlavay, A., Cleasson, Y. and Ribbing, C. G., Thin Solid Films, 1990, 186, 15.
3. Wu, H. Z., Chou, T., Mishra, A., Anderson, D. R., Lampert, L. K. and Gujrathi, S. C., Thin Solid Films, 1990, 191, 55.
4. Braic, M., Braic, V., Zoita, C.N., Melinte, D., Kiss, A., Musa, G., in Proceedings of the 3rd Int. Conf. on Reactive Plasmas and 14th Symposium on Plasma Processing, Nara, Japan, 1997, p. 275.
5. Lieberman, M.A., Lichtenberg, A.J., in Plasma Discharges and Materials Processing, J. Wiley & Sons, 1994, p.353.
6. Sakaki, M. and Sakakibara, T., IEEE Trans. on Plasma Science, 1994, 22, 104.