High power laser-plasma X-ray source for lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 818-833

  Gaeta, C J ^a   Rieger, H ^a   Turcu, I C E ^a   Forber, R A ^a   Cassidy, K L ^a   Campeau, S M ^a   Powers, M J ^a   Maldonado, J R ^a   Morris, J H ^a   Foster, R M ^a   Smith, H I ^a   Lim, M H ^a  

^a JMAR Technologies Inc   (United States)

Author keywords

Diode pumped solid state laser; GaAs semiconductor devices; Laser produced plasma; X ray lithography; X ray source

Indexed keywords

HIGH POWER LASERS; LASER PRODUCED PLASMAS; NEODYMIUM LASERS; PHOTORESISTS; SEMICONDUCTING GALLIUM ARSENIDE; X RAY ANALYSIS;

X RAY STEPPERS;

X RAY LITHOGRAPHY;

EID: 2342500288     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472353     Document Type: Conference Paper

References (10)

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