SCOPUS 정보 검색 플랫폼

Volumn 2723, Issue , 1996, Pages 299-307

Characterization techniques for x-ray lithography sources

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; LASER PRODUCED PLASMAS; PARAMETER ESTIMATION; PHOTONS; SPECTROMETERS; X RAY SPECTROSCOPY;

LITHOGRAPHIC CONVERSION EFFICIENCY; PHOTON ENERGY;

X RAY LITHOGRAPHY;

EID: 0030314701 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.240494 Document Type: Conference Paper

Times cited : (5)

References (4)

1
- 0027578282
- Measurements of effective wavelength of X-ray lithography sources
- Microcircuit Engineering 92
- (1993) Microelectronic Engineering , vol.21 , pp. 113-116
- Maldonado, J.R.¹ Babich, I.² Hsia, L.C.³ Rippstein, R.⁴ Flamholz, A.⁵ Dimilia, V.⁶

2
- 0029489087
- Prospects for granular x-ray lithography sources
- invited paper
- (1995) Proc. SPIE on Application of Laser Plasma Radiation II , vol.2523 , pp. 2-22
- Maldonado, J.R.¹

3
- 0027809289
- Fast dosimeter film for evaluation of x-ray lithography sources
- (1993) Mat. Res. Symp. Proc. , vol.306 , pp. 175-179
- Maldonado, J.R.¹ Pomerene, A.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.