Low-loss InP-based photonic-crystal waveguides etched with Ar/Cl2 chemically assisted ion beam etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 2, 2003, Pages 900-903

  Mulot, M ^a   Anand, S ^a   Swillo, M ^a   Qiu, M ^a   Jaskorzynska, B ^a   Talneau, A ^b  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CRYSTALS; ETCHING; INDIUM COMPOUNDS; ION BEAMS; PHOTONS;

ION BEAM ETCHING;

OPTICAL WAVEGUIDES;

EID: 0037279896     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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