Interdiffusion in NiFe/Cu/NiFe trilayers: Possible failure mechanism for magnetoelectronic devices

Applied Physics Letters

Volumn 77, Issue 3, 2000, Pages 358-360

  Bruckner W ^a   Baunack, S ^a   Hecker, M ^a   Monch J I ^a   Van Loyen, L ^a   Schneider, C M ^a  

^a IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 2342449754     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.126975     Document Type: Article

References (13)

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