Highly sensitive monitoring of Ru etching using optical emission

Electrochemical and Solid-State Letters

Volumn 8, Issue 7, 2005, Pages

  Shamiryan, D ^a   Baklanov, M R ^a   Boullart, W ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; EMISSION SPECTROSCOPY; ETCHING; FLUORESCENCE; LIGHT EMISSION; MOSFET DEVICES; SPECTROMETERS; X RAY PHOTOELECTRON SPECTROSCOPY;

EMISSION LINES; END-POINT DETECTION; METAL GATE ELECTRODES; OPTICAL EMISSION;

RUTHENIUM;

EID: 23244449068     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1928227     Document Type: Article

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