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Volumn 282, Issue 3-4, 2005, Pages 359-364

Ultraviolet lasing with low excitation intensity in deep-level emission free ZnO films

Author keywords

A3. Laser epitaxy; B1. Zinc compounds; B2. Semiconducting II VI materials

Indexed keywords

CRYSTAL LATTICES; EXCITONS; LASER ABLATION; LIGHT EMITTING DIODES; MAGNETRON SPUTTERING; PHOTOLUMINESCENCE; SEMICONDUCTOR MATERIALS; ZINC COMPOUNDS;

DEEP-LEVEL EMISSIONS; LASER EPITAXY; OPTICAL GEOMETRY; ULTRAVIOLET LIGHT-EMITTING DEVICES;

ZINC OXIDE;

EID: 23144445606 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.05.019 Document Type: Article

Times cited : (11)

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